High-Power Intermediate Frequency Magnetron Sputtering Power Supply

High-Power Intermediate Frequency Magnetron Sputtering Power Supply

High-Power Intermediate Frequency Magnetron Sputtering Power Supply Features The high power MF magnetron sputtering power source can implement the function of arc extinguishing reasonably and quickly on the basis of fully meeting the power requirement. And the power supply has perfect display...
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Product Details

Features

●  The high power MF magnetron sputtering power source can implement the function of arc extinguishing reasonably and quickly on the basis of fully meeting the power requirement. And the power supply has perfect display and protection capabilities of under voltage, overvoltage, overload, overheating, etc. Also, it can sputter non-conductive targets and increase ionization rate to effectively overcome target poisoning and abnormal discharge.

●  The power supply adopts advanced high-frequency inverter power supply technology and IGBT power module to reduce the output energy storage element, as a result, the coating layer is extremely dense and smooth.

●  Using the touch screen microcontroller, the power supply is highly integrated and powerful with easy operation. The display of current and voltage is very clear and intuitive.

●  The PHP arc suppression technology makes sure that users can control the quality of coating layer more convenient in the process of surface treatment. Also, having the features of voltage stabilization and ideal coup de foue, the power supply can effectively inhibit the arcing on the workpiece surface, and significantly improve the production yield, as well as the surface fineness and film adhesion of plating pieces.

●  The power supply offers three modes (constant voltage, constant current and constant power) from which to choose. Compared with the traditional constant current mode, the constant power mode can better ensure the repeatability of the coating process.

●  The power supply can communicate with the host computer through the digital ports such as RS232, RS485, WIFI and so on, which expands its control function.

●  With wide range of output power and frequency, the power supply can meet the needs of different process applications.

●  Main parameters of it can be adjusted within a large range.

 

Specification

Product Model

EP80A125H

Input Power & Frequency (V/Hz) Thre Phase and Four Wire

AC380+N

60Hz

Output Current Range(A)

0~80

Accuracy For Constant Voltage and Constant Current

≤1%

Rated Output Voltage(DCV)

1250

Maximum Output Power (KW)

100

Duty Cycle(%)

80

Weight(KG)

80

External Dimensions(MM)

575(D)×480(W)×250(H)

Insulation Grade

B

Productivity(%)

90

Enclosure Protection Class

Ip21

Operating Mode

Constant Voltage, Constant Current And Constant Power Modes are Optional.Conventional Output: Constant Current

Cooling Mode

Water-Cooling

External   Interface

This Series Products all Adopt The Touch Screen Microcontroller

 

Performance Comparison Compared with the 30kw MF Magnetron Sputtering Power Supply

Product Mode

30kw   Mid-Frequency

EP125A80H

Frequency(KHZ)

40

40

Duty Cycle(%)

80

80

Voltage(V)

800

800

Current(A)

38

125

Maximum Power (KW)

30

100

 

Advantages of the High Power MF Magnetron Sputtering Power Source EP125A80H

●  High space utilization of furnace

EP125A80H requires less intermediate frequency targets, and ensure higher utilization of furnace and better production capacity.  

●  Excellent arc suppression technology

EP125A80H adopts PHP arc suppression technology, so users can conveniently control the quality of the film in the process of surface treatment to get better film structure.

●  Good compatibility

Users can replace the existing magnetron sputtering power supply with EP125A80H directly, and only need to replace the cooling system instead of replacing the cathode materials and magnetic fields.

●  High power-to-volume ratio

High power-to-volume ratio makes the integration of equipment installation easier for users.

 

Application

High power MF magnetron sputtering power source is widely used in plasma, physical, chemical, medical and various scientific research fields, it can meet a wide range of process requirements especially in vacuum coating equipment.


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