High Quality Rotatable Sputtering Target
IKS specializes in producing high purity rotatable sputtering targets with the optimal process stability and performance for application in semiconductor, physical vapor deposition (PVD) display and optical industry. Our targets are offered in your specific requirements with the minimum purity of 99.5% up to 99.99% for pure elements and alloys.
Adopting advanced Hot Isostatic Pressing (HIP) and Vacuum Melting technology, the rotatable sputtering targets from IKS are characterized by high purity, high density, homogenous composition, fine grain size and long service life. We monitor every step (from the raw materials to the finished products) to make sure that only high-quality targets can be shipped from our factories.
IKS manufactures all sizes of high quality rotatable targets. Let us know the material and dimensions you need and we will meet your special requirement.
Main Products:
Material | Symbol | Atomic Ratio | Purity | Relative Density | Technology | Advantage |
Chromium | Cr | _____ | 99.5%~99.95% | >99% | Hot Isostatic Pressing (HIP) | Good Oxidation Resistance |
Tungsten | W | _____ | 99.5%~99.95% | >99% | Hot Isostatic Pressing (HIP) | High Hardness |
Titanium | Ti | _____ | 99.9%~99.99% | >99% | Vacuum Melting | Good Wear Resistance |
Nickel | Ni | _____ | 99.9%~99.99% | >99% | Vacuum Melting | Great Corrosion Resistance |
Molybdenum | Mo | _____ | 99.9%~99.99% | >99% | Vacuum Melting | Great Corrosion Resistance |
Silicon | Si | _____ | 99.99% | >99% | Vacuum Melting | High Hardness |
Silver | Ag | _____ | 99.9%~99.99% | >99% | Vacuum Melting | Good Electrical and Thermal Conductivity |
Tantalum | Ta | _____ | 99.9%~99.99% | >99% | Vacuum Melting | High Ductility |
Copper | Cu | _____ | 99.9%~99.99% | >99% | Vacuum Melting | High Ductility, Good Thermal Conductivity and Corrosion Resistance |
Graphite | _____ | 99.9%~99.99% | >99% | Vacuum Melting | High Hardness | |
aluminum | Al | _____ | 99.9%~99.99% | >99% | Vacuum Melting | Good Ductility, Thermal Conductivity and Corrosion Resistance |
Silicon-Aluminum | SiAl | 25/75 30/70 40/60 50/50 | 99.9%~99.99% | >99% | Hot Isostatic Pressing (HIP) | High Ductility and Good Wear Resistance |
Titanium-Aluminum | TiAl | 30/70 33/67 40/60 45/55 50/50 60/40 70/30 75/25 80/20 | >99.7% (2N7) | >99% | Hot Isostatic Pressing (HIP) | High Mechanical Strength and Good Corrosion Resistance |
Chromium-Aluminum | CrAl | 25/75 30/70 40/60 50/50 | >99.7% (2N7) | >99% | Hot Isostatic Pressing (HIP) | Good Oxidation Resistance and Corrosion Resistance |
Titanium-Aluminum-Silicon | TiAlSi | 30/60/10 40/50/10 | >99.7% (2N7) | >99% | Hot Isostatic Pressing (HIP) | High Hardness and Ductility |
Chromium-Aluminum-Silicon | CrAlSi | 30/60/10 40/50/10 | >99.7% (2N7) | >99% | Hot Isostatic Pressing (HIP) | Good Oxidation Resistance and Corrosion Resistance |
More information:
Certification: ISO9001
Average Grain Size: 30-40μm (national standard is 100μm)
Stock Dimensions: OD70xID56xL/ OD100xID80xL (unlimited length)
Other special specifications are available on customer’s request.
Quality Analysis of TiAlSi Sputtering Target
(Take TiAlSi 30/60/10 at% as a sample)
Main component (wt%) | Impurity content (%) | |||||
TiAlSi | C | N | O | H | Fe | Ca |
>99.7 | 0.0120 | 0.0007 | 0.1995 | 0.0110 | 0.0620 | 0.0048 |
Ti | Al | Si | ||||
7.9% | 48.86% | 43.24% | ||||
True density: 3.42(g/cm3)
Theoretical density: >99%
The average grain size of our rotatable target is 30-40μm which is far below the national standard (100μm).
Compared to Planar Targets, Our Rotatable Sputtering Targets Can:
● Reduce the cost of ownership for large area coating operations.
● Provide larger erosion zones that provide 2 to 2.5 times the material utilization.
● Have longer service life that in turn results in much longer production runs and reduced downtime of the system.
● Increase the throughput of the coating equipment.
● Allow the use of higher power densities, and as a consequence, an increased deposition speed can be seen along with an improved performance during reactive sputtering.
Application:
Nowadays, rotatable target technology has been widely used in large area coating manufacturing of architectural glass, flat panel displays, solar photovoltaic and decorative coating. Our rotatable targets are very friendly to decorative film which ensures scratch resistance and decorative colorful finishes of hard coating on mobile phones, jewelry, watches, eyewear, automotive decoration, domestic appliances, sanitary wares, hardware, etc.