High Purity Planar Sputtering Target

High Purity Planar Sputtering Target

High Quality Planar Sputtering Target IKS provides high-quality planar sputtering targets for a wide range of applications for ferromagnetic, complex oxides, and semiconducting films. Our targets are offered in various purity levels to suit your specific requirements with the minimum purity of...
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High Quality Planar Sputtering Target

 

IKS provides high-quality planar sputtering targets for a wide range of applications for ferromagnetic, complex oxides, and semiconducting films. Our targets are offered in various purity levels to suit your specific requirements with the minimum purity of 99.5% up to 99.99% for pure elements and alloys.

 

Adopting advanced hot isostatic pressing (HIP), vacuum sintering and vacuum melting technologies, the planar sputtering targets from IKS are characterized by high purity, high density, homogenous composition, fine grain size and long service life. We monitor every step (from the raw materials to the finished products) to make sure that only high-quality targets can be shipped from our factories.

 

IKS manufactures all shapes and sizes of high quality planar targets. Let us know the material and dimensions you need and we will meet your special requirement.

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Main Products:

Material

Symbol

Atomic Ratio

Purity

Relative Density

Stock Dimensions

Technology

Features

Chromium

Cr

_____

99.5%~99.95%

>99%

750x125x10mm
170x75x12mm

Hot Isostatic    Pressing (HIP)

Good Oxidation Resistance

Tungsten

W

_____

99.9%~99.95%

>99%

750x125x10mm
     170x75x12mm

Hot Isostatic    Pressing (HIP)

High Hardness

Titanium

Ti

_____

99.9%~99.99%

>99%

750x125x10mm
     170x75x12mm

Vacuum Melting

Good Wear  Resistance

Nickel

Ni

_____

99.9%~99.99%

>99%

750x125x10mm
     170x75x12mm

Vacuum Melting

Great Corrosion Resistance

Molybdenum

Mo

_____

99.9%~99.99%

>99%

750x125x10mm
     170x75x12mm

Vacuum Melting

Great Corrosion Resistance

Silicon

Si

_____

99.99%

>99%

750x125x10mm
     170x75x12mm

Vacuum Sintering

High Hardness

Silver

Ag

_____

99.9%~99.99%

>99%

750x125x10mm
     170x75x12mm

Vacuum Melting

Good Electrical and Thermal Conductivity

Tantalum

Ta

_____

99.9%~99.99%

>99%

750x125x10mm
     170x75x12mm

Vacuum Melting

High Ductility

Copper

Cu

_____

99.9%~99.99%

>99%

750x125x10mm
     170x75x12mm

Vacuum Melting

High Ductility, Good Thermal Conductivity and Corrosion Resistance

Graphite


_____

99.9%~99.99%

>99%

750x125x10mm
     170x75x12mm

Vacuum Sintering

High Hardness

Aluminum

Al

_____

99.9%~99.99%

>99%

750x125x10mm
     170x75x12mm

Vacuum Melting

Good Ductility,Thermal Conductivity and Corrosion Resistance

Silicon-Aluminum

SiAl

25/75   30/70   40/60      50/50

99.9%~99.99%

>99%

750x125x10mm
     170x75x12mm

Hot Isostatic   Pressing (HIP)

High Ductility and Good Wear Resistance

Titanium-Aluminum

TiAl

30/70  33/67   40/60      45/55   50/50   60/40      70/30   75/25   80/20

>99.7% (2N7)

>99%

754x154x18mm
     331x174x22mm

Hot Isostatic   Pressing (HIP)

High Mechanical Strength and Good Corrosion Resistance

Chromium-Aluminum

CrAl

25/75   30/70   40/60      50/50

>99.7% (2N7)

>99%

754x154x18mm
     490x96x8mm

Hot Isostatic    Pressing (HIP)

Good Oxidation Resistance and Corrosion Resistance

Titanium-Aluminum-Silicon

TiAlSi

30/60/10   40/50/10

>99.7% (2N7)

>99%

754x154x18mm
     331x174x22mm

Hot Isostatic    Pressing (HIP)

High Hardness    and Ductility

Chromium-Aluminum-Silicon

CrAlSi

30/60/10   40/50/10

>99.7% (2N7)

>99%

754x154x18mm
     331x174x22mm

Hot Isostatic    Pressing (HIP)

Good Oxidation    Resistance and Corrosion Resistance

 

More information:

Certification: ISO9001

Average Grain Size: 30-40μm (national standard is 100μm)

Shape: Rectangular targets, Round target

Other special specifications are available on customer’s request.

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Quality Analysis of TiAl Sputtering Target

(Take TiAl 30/70 at% as a sample)

Main component (wt%)

Impurity content (%)

TiAl

C

N

O

Fe

Si

S

>99.7

0.01

0.006

0.2

0.06

0.02

0.002

Ti

Al





46.87%

balance





Dimension: 754x154x18mm

True density: 3.31(g/cm3)

Theoretical density: >99%


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The average grain size of our planar target is 30-40μm which is far below the national standard (100μm).

 

The IKS Advantages:

● Variety of materials including: Silver, Titanium, Aluminum, Silicon, Silicon-Aluminum Titanium-Aluminum-Silicon, Graphite and so on to suit your requirements.

● Incredibly tiny grain size and uniform microstructure assure consistent process performance through full end of life.

● Complete homogeneity and high purity levels of targets ensure the coating process is more stable and the deposited layers are of higher quality.

● Excellent density ensure the coating process can benefit from a particularly high level of conductivity

● The wonderful sputtering speeds due to the high density can help you save more time.

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Application:

In recent years, sputtering has been widely applied in semiconductor industry for Thin Film deposition of various materials in integrated circuit processing, architectural and automotive glass for energy conservation, colorful decorative coatings for hardware, hard wearing coatings for tools and consumer goods, and deposition of metals during fabrication of CDs, etc.

 

Function of Hard Wearing Coatings:

Provide hard surfaces with excellent corrosion resistance and wear resistance for cutting tools, punching and forming moulds to increase their service time, at the same time, the higher feed speeds, good cutting performance and excellent metal removal rates can be achieved easily.

Also, when used in automotive engines, it can effectively reduce friction coefficient of surface on precision components.

 

Function of Decorative Coatings:

Ensure good scratch resistance and decorative colorful finishes for hard coating on mobile phones, jewelry, watches, eyewear, automotive decoration, domestic appliances, bathroom and kitchen hardware, etc.

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