The Rise Of PVD Titanium Plating New Technology

- Jan 03, 2019-

The rise of PVD titanium plating new technology


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PVD(Physical Vapor Deposition) refers to a process in which a substance is transferred by a Physical process and an atom or molecule is transferred from the source to the substrate surface. Its function is to make some of the special properties (high strength, wear resistance, heat dissipation, corrosion resistance, etc.) of particles sprayed on the mother of lower performance, so that the mother has better performance. PVD basic methods: vacuum evaporation, sputtering, ion plating (hollow cathode ion plating, hot cathode ion plating, arc ion plating, reactive ion plating, rf ion plating, dc discharge ion plating).


PVD is an abbreviation of Physical Vapor Deposition(Physical Vapor Deposition). It is an arc discharge technology with low voltage and large current that USES gas discharge to evaporate the target material and ionize both the evaporated substance and the gas under vacuum conditions. It USES the acceleration of electric field to deposit the evaporated substance and its reaction products on the workpiece.


PVD technology appears in the preparation of thin films with high hardness, low friction coefficient, good wear resistance and chemical stability and other advantages. At first, the successful application in the field of high speed steel tools has attracted great attention from the manufacturing industry all over the world. While developing high performance and high reliability coating equipment, people have also carried out more in-depth coating application research in cemented carbide and ceramic tools. Compared with the CVD process, PVD process temperature is low, under 600 when the bending strength of cutting tool materials; The internal stress state of the film is compressive stress, which is more suitable for the coating of cemented carbide precision and complex tools. PVD process has no adverse impact on the environment, in line with the development direction of modern green manufacturing. At present, PVD coating technology has been widely used in the coating treatment of carbide end milling cutter, drill bit, step drill, oil hole drill, reamer, tap, indexable milling cutter, turning blade, special-shaped tool, welding tool and so on.


PVD technology not only improves the bonding strength between thin film and tool matrix material, but also develops coating composition from the first generation TiN to TiC, TiCN, ZrN, CrN, MoS2, TiAlN, TiAlCN, tin-aln, CNx, DLC and ta-c, etc.


Enhanced magnetic-controlled cathode arc: cathode arc technology is to complete the deposition of thin film materials under vacuum condition by disintegrating the target material into ion state through low voltage and high current. The enhanced magnetic-controlled cathode arc utilizes the combined action of electromagnetic field to effectively control the arc on the surface of the target material, so that the ionization rate of the material is higher and the film performance is better.


Filtered cathodic arc: filtered cathodic arc (FCA) electromagnetic filtration system, equipped with high efficient ion source can be produced by the macroscopic particles in plasma and ion mass filter clean, after magnetic filtration of sedimentary particles ionization rate was 100%, and can filter out the larger particles, so the preparation of the film is very compact and smooth, with good corrosion resistance, and the adhesion strength of the body is very strong.


Magnetron sputtering: in a vacuum environment, the target material is bombarded by ionized inert gas ions through the combined action of voltage and magnetic field, resulting in the target material being ejected in the form of ions, atoms or molecules and deposited on the substrate to form a film. Both conductive and non-conductive materials can be sputtered as target materials depending on the ionization power supply used.


Ion beam DLC: carbon hydrogen gas is ionized into plasma in ion source. Under the combined action of electromagnetic field, carbon ion is released from ion source. The ion beam energy is controlled by adjusting the voltage applied to the plasma. The hydrocarbon ion beam is directed to the substrate and the deposition rate is proportional to the ion current density. The ion beam source of star arc coating USES high voltage, so the ion energy is larger, which makes the film and substrate have good adhesion. Higher ion current makes DLC film deposition faster. The main advantage of ion beam technology is that it can deposit ultra-thin and multi-layer structure, the precision of process control can reach several angstrae, and the defects caused by particle contamination in the process can be minimized.