Magnetron sputtering coating
Magnetron sputtering coating principle:
In the process of accelerating the electrons to fly to the substrate under the action of electric field, they collide with argon atoms and ionize a large number of argon ions and electrons, which fly to the substrate. Under the action of electric field, argon ion speeds up the bombardment of target material, sputtering out a large number of target atoms, and depositing neutral target atoms (or molecules) on the substrate to form a film.
Magnetron sputtering principle.
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