What is the principle of rainbow color vacuum electroplating?
The distance from the evaporation source to the substrate should be less than the mean free path of the vapor molecules in the residual gas to avoid chemical interactions caused by the collision of the vapor molecules with the residual gas molecules. The average kinetic energy of vapor molecules is about 0.1 ~ 0.2 electron volts. There are three types of evaporation sources. (1) Resistance heating source: with refractory metal such as tungsten, tantalum made of boat foil or filamentous, with an electric current, heating above it or placed in the crucible of evaporating material. The resistance heating source is mainly used to vaporize Cd, Pb, Ag, Al, Cu, Cr, Au, Ni and other materials. High frequency induction heating source: heating crucible and evaporating material with high frequency induction current; (3) Electron beam heating source: suitable for materials with high evaporation temperature (not less than 2000[618-1]), i.e. materials bombarded with electron beam to make them evaporate. Compared with other vacuum coating methods, evaporative coating has a higher deposition rate and can be used to prepare simple compound films that are not easily decomposed by heat. Molecular beam epitaxy method can be used to deposit high purity single crystal layer. Growth - doped GaAlAs single crystal layer of molecular beam epitaxy device. A jet furnace is equipped with a molecular beam source, and when it is heated to a certain temperature under ultra-high vacuum, elements in the furnace are ejected to the substrate in a stream of molecular beams. When the substrate is heated to a certain temperature, the molecules deposited on the substrate can migrate, and the crystal growth sequence of the substrate lattice can be obtained by molecular beam epitaxy. The required stoichiometric ratio of high-purity compound single crystal film can be obtained. The slowest growth rate of the film can be controlled within 1 monolayer second. By controlling the baffle, the single crystal thin film of the required composition and structure can be made precisely.
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