the basic principle of sputtering coating

- Apr 02, 2020-

 the basic principle of sputtering coating: under the vacuum condition of argon (Ar) gas, argon gas glow discharge, then argon (Ar) atoms ionized into argon ion (Ar), argon ion in the action of electric field force, accelerated bombardment to the cathode target material made by the plating material, the target material will be sputtering out and deposited on the surface of the workpiece. The incident ions in the sputtering film are generally obtained by glow discharge in the range of l0-2pa ~ 10Pa, so the sputtering particles are easy to collide with the gas molecules in the vacuum chamber when flying towards the matrix, making the motion direction random and the deposited film easy to be uniform.

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