Sputtering coating process concept
The so-called sputtering coating refers to the method of making films by bombarding the target material with energy-charged particles (such as positive ions) in a vacuum chamber, so that the atoms or groups on the surface of the target material can escape. The escaped atoms form a film on the surface of the workpiece with the same composition as the target material. This method of preparing films is called sputtering coating. At present, sputtering method is mainly used to form metal or alloy films, especially for making electrode and glass surface infrared reflector films. In addition, sputtering is also used to prepare functional films, such as in2O3-sno2 transparent conductive ceramic films in liquid crystal display devices.
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