Mechanical properties of TiN/Ti nanomaterials by arc ion plating

- Mar 30, 2019-

Mechanical properties of TiN/Ti nanomaterials by arc ion plating

 

TiN/Ti multilayer films with nano-modulation cycles were synthesized by multi-arc ion plating with different deposition parameters. The effects of modulation period on the microstructure, surface morphology and mechanical properties of TiN/Ti nanomaterials were studied by X-ray diffraction (XRD), scanning electron microscope (SEM), xp-2 bench tester, xp-type nano indentation tester and X-ray energy spectrometer (EDS). The results show that the TiN film is composed of TiN and Ti, and there is no other heterogeneous phase. TiN/Ti multilayer film has a dense, smooth appearance and uniform golden color. With the decrease of modulation cycle, the number and size of large particles on the surface of the film decrease, and the nitrogen content increases gradually, and the hardness of the film presents an increasing trend.

 

In recent years, physical vapor deposition of thin film prepared by high hardness, chemical performance is stable, and has a good friction performance advantages, is widely used in cutting tools, mold, all kinds of wear-resistant parts and areas such as microelectronics, but under the high temperature of 550 easy oxidation generating TiO2, affect their performance. With the continuous improvement of processing requirements, it becomes more and more important to study films with better comprehensive properties. The performance of thin films has been improved to some extent by improving processes, such as magnetic filtration of large droplets, composite plating of films to optimize properties, and addition of other metals, such as Al, C, Cr, Zr, etc. It has been reported in the literature that the structural characteristics of multi-layer composite materials and the complex interface between layers can improve the toughness and cracking resistance of the film. However, there are few studies on its properties at present. Based on TiN coating and multi-layer structure, this paper adopts multi-arc ion plating method to prepare TiN/Ti multi-layer film, and analyzes and studies the influence of modulation period on its structure and performance.

 

1. Experiment

TiN/Ti multilayer films were prepared by SA-700 6T multiarc ion plating on high speed steel substrate.

 

The sample size of high-speed steel substrate is 10mm 10mm 15mm. Firstly, the sample of high-speed steel substrate is polished successively on sand paper no. 600, no. 900, no. 1200, no. 1500 and no. 2000. Then, corundum micro-powder is polished on the polishing machine to make the surface of high-speed steel substrate appear as a mirror. Before coating, the samples were washed with anhydrous ethanol and acetone for 15 min respectively, and then dried and placed on the sample rack in the chamber with a target base distance of 300 mm. At work, the pure Ti target deposition film is used to ignite the cathode target arc, which is vaporized by the arc. Vacuum of the deposition chamber was pumped below 5 10-3 Pa, and Ar gas was injected for glow and sputtering cleaning.

 

Because of its good fracture toughness and superhard supermodel effect, nanometer multilayer film has attracted much attention. For the nanometer multilayer film formed by Ti and TiN, the sum of the thickness of the adjacent two layers is called the modulation period, and the ratio of their thickness is called the modulation ratio. The modulation period is one of the main factors affecting the performance of TiN/Ti multilayer films. In the experiment, it is assumed that the deposition rates of the two thin films are the same, and the deposition time ratio of TiN layer and Ti layer is 5:1, that is, the nominal modulation ratio is 5:1. In order to prepare multilayer films with excellent performance, this experiment designed to deposit 4 groups of samples with different modulation periods under the same nominal modulation ratio. The specific experimental process parameters are shown in table 1. Firstly, the Ar gas flow and N2 flow were adjusted to deposit 50minTiN. The Ar gas flow and pressure were adjusted to deposit 10 minTi. The vacuum technology network (http://www.chvacuum.com/) believes that under the same experimental conditions, the cycle number is changed by changing the time to deposit TiN and Ti by ensuring that the total experimental time and the modulation ratio are constant.

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Table 1 TiN/Ti multilayer experimental process parameters

 

The effects of modulation period on the microstructure, surface morphology and mechanical properties of TiN/Ti nanofilms were studied by X-ray diffraction (XRD), scanning electron microscope (SEM), xp-2 bench tester, xp-type nano-indentation tester and X-ray energy spectrometer (EDS).

 

3. Conclusion

 (1) the film was composed of TiN and Ti, and there were no other heterogeneous phases. Moreover, the TiN film grew optimally along the (111) closely arranged surface with a plane-centered cubic structure.

(2)TiN/Ti multilayer film has a dense, smooth appearance and a uniform golden color. With the decrease of modulation cycle, the number and size of large particles on the surface of the film decrease, and the content of nitrogen increases gradually, indicating that Ti and N2 react gradually fully.

(3) with the decrease of modulation period, vickers hardness presents an increasing trend, indicating that modulation period has a significant impact on the hardness of the film.

 

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