How does PVD sputtering process work in the vacuum coating
PVD (Physical Vapor Deposition) technique is one of the main technology of preparation of thin film materials, under the condition of vacuum with Physical method, some material gasification into gaseous atoms, molecules or partial ionization ion, and through the low pressure gas (or plasma) process, the Deposition with anti-reflection, reflecting on the surface of substrate material, protect conductive, permeability, insulation, corrosion resistance, oxidation resistance, radiation protection, decoration and so on special function of the technology of thin film materials. Substances used to prepare thin film materials are called PVD coating materials. After years of development, PVD coating technology has been widely used in the fields of electronics, optics, machinery, construction and materials, etc. Sputtering coating and vacuum evaporation coating are the two most mainstream PVD coating methods.
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