Experimental Materials And Methods For Effect Of Arc Source Current On Tin Film Structure

- Jun 22, 2018-


In this paper, TiN thin films were deposited on stainless steel substrate and Si wafer by multi-arc ion coating machine. The effect of arc source current on the structure and tribological properties of TiN thin films was studied from the principle of multi-arc ion plating.

 

Experimental materials and methods

 

The substrate material is stainless steel (1Cr18Ni9Ti) of 20 mm×20 mm×2 mm, with Si wafers. The preparation of the film was performed on a multi-arc ion coating machine. The sample was mechanically polished, alkali-washed, ultrasonically cleaned in alcohol, and finally fully dried into a clean coating chamber. Before the coating process, the substrate was cleaned by Ar+ etching for 5 min. The flow rate of argon gas during coating was zero, and the fixed flow rate of N2 was 0.22 SLM/s. The specific process parameters are listed in Table 1.

 

Table.1 TiN film deposition process parameters

 

Arc Source Current (A)Pressure (x10-1Pa)Temperature of Sudstrate (℃)
404.8
290
504.5306
60
4.3326
703.3345
802.430
901.3398
1001.0402


The surface morphology and fracture surface morphology of the film were observed by field emission scanning electron microscopy (FE-SEM). The hardness of the TiN film was measured with a microhardness tester with the load is 25 g and the loading time is 10 s. The friction coefficient of the film was measured by self-altered laboratory device. The TiN film sample is combined with the A3 steel to form a pair of friction pairs. During the test, the upper sample is fixed, the A3 steel disk rotates in dry friction, the rotational speed is 0.87rev/min, and the experimental load is 1N.