Characteristics of electron beam processing technology
The electron beam can be focused very fine (up to l ~ 0.1 m), so it can be micromachined.
The range of processed materials is wide. Can process various mechanical properties of conductor, semiconductor and non-conductor materials.
Processing efficiency is very high.
Processing in vacuum, less pollution, processing surface is not easy to be oxidized.
Electron beam processing needs a complete set of special equipment and vacuum system, the price is more expensive, so in the production is limited to a certain extent.
Ion beam processing principle
Under vacuum conditions, the ion beam generated by the ion source is accelerated, focused and projected onto the workpiece surface. Because ion has positive charge, its mass number is thousands or even tens of thousands of times larger than electron, it has a great impact kinetic energy when hitting the workpiece, through the micro mechanical impact to achieve the processing of the workpiece.
Ion beam and electron beam processing principle is basically the same. The main difference is that ions have a positive charge. Their mass is thousands or even tens of thousands of times larger than electrons, so they accelerate more slowly in the electric field.
Electron beam processing is processed by converting electrical energy into heat energy. Ion beam processing is processed by converting electrical energy into kinetic energy.
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