High Purity Rotatable Sputtering Target

High Purity Rotatable Sputtering Target

Introduction IKS specializes in producing high purity rotatable sputtering targets with the optimal process stability and performance for application in semiconductor, physical vapor deposition (PVD) display and optical industry. Our targets are offered in your specific requirements with the...
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Product Details


Introduction


IKS specializes in producing high purity rotatable sputtering targets with the optimal process stability and performance for application in semiconductor, physical vapor deposition (PVD) display and optical industry. Our targets are offered in your specific requirements with the minimum purity of 99.5% up to 99.99% for pure elements and alloys.


Adopting advanced Hot Isostatic Pressing (HIP) and Vacuum Melting technology, the rotatable sputtering targets from IKS are characterized by high purity, high density, homogenous composition, fine grain size and long service life. We monitor every step (from the raw materials to the finished products) to make sure that only high-quality targets can be shipped from our factories.


IKS manufactures all sizes of high quality rotatable targets. Let us know the material and dimensions you need and we will meet your special requirement.



Main Products:


Material

Symbol

Atomic Ratio

Purity

Relative Density

Technology

Advantage

Chromium

Cr

_____

99.5%~99.95%

>99%

Hot    Isostatic Pressing (HIP)

Good Oxidation Resistance

Tungsten

W

_____

99.5%~99.95%

>99%

Hot    Isostatic Pressing (HIP)

High Hardness

Titanium

Ti

_____

99.9%~99.99%

>99%

Vacuum Melting

Good Wear Resistance

Nickel

Ni

_____

99.9%~99.99%

>99%

Vacuum Melting

Great Corrosion Resistance

Molybdenum

Mo

_____

99.9%~99.99%

>99%

Vacuum Melting

Great Corrosion Resistance

Silicon

Si

_____

99.99%

>99%

Vacuum Melting

High Hardness

Silver

Ag

_____

99.9%~99.99%

>99%

Vacuum Melting

Good Electrical and Thermal Conductivity

Tantalum

Ta

_____

99.9%~99.99%

>99%

Vacuum Melting

High Ductility

Copper

Cu

_____

99.9%~99.99%

>99%

Vacuum Melting

High Ductility, Good Thermal Conductivity and Corrosion Resistance

Graphite


_____

99.9%~99.99%

>99%

Vacuum Melting

High Hardness

Aluminum

Al

_____

99.9%~99.99%

>99%

Vacuum Melting

Good Ductility, Thermal Conductivity and Corrosion Resistance

Silicon-Aluminum

SiAl

25/75

30/70

40/60

50/50

99.9%~99.99%

>99%

Hot Isostatic Pressing (HIP)

High Ductility and Good Wear Resistance

Titanium-Aluminum

TiAl

30/70

33/67

40/60

45/55

50/50

60/40

70/30

75/25     80/20

>99.7%    (2N7)

>99%

Hot Isostatic Pressing (HIP)

High Mechanical Strength and Good Corrosion Resistance

Chromium-Aluminum

CrAl

25/75

30/70

40/60

50/50

>99.7%    (2N7)

>99%

Hot Isostatic Pressing (HIP)

Good Oxidation Resistance and Corrosion Resistance

Titanium-Aluminum-Silicon

TiAlSi

30/60/10   40/50/10

>99.7%    (2N7)

>99%

Hot Isostatic Pressing (HIP)

High Hardness and Ductility

Chromium-Aluminum-Silicon

CrAlSi

30/60/10   40/50/10

>99.7%    (2N7)

>99%

Hot Isostatic Pressing (HIP)

Good Oxidation Resistance and Corrosion Resistance




More information:


Certification: ISO9001

Average Grain Size: 30-40μm (national standard is 100μm)

Stock Dimensions: OD70xID56xL/ OD100xID80xL (unlimited length)

Other special specifications are available on customer's request.




Quality Analysis of TiAlSi Sputtering Target

(Take TiAlSi 30/60/10 at% as a sample)


Main component (wt%)

Impurity content (%)

TiAlSi

C

N

O

H

Fe

Ca

>99.7

0.0120

0.0007

0.1995

0.0110

0.0620

0.0048

Ti

Al

Si




7.9%

48.86%

43.24%





True density: 3.42(g/cm3)

Theoretical density: >99%


The average grain size of our rotatable target is 30-40μm which is far below the national standard (100μm).




Compared to Planar Targets, Our Rotatable Sputtering Targets Can:


● Reduce the cost of ownership for large area coating operations.

● Provide larger erosion zones that provide 2 to 2.5 times the material utilization.

● Have longer service life that in turn results in much longer production runs and reduced downtime of the system.

● Increase the throughput of the coating equipment.

● Allow the use of higher power densities, and as a consequence, an increased deposition speed can be seen along with an improved performance during reactive sputtering.




Application:


Nowadays, rotatable target technology has been widely used in large area coating manufacturing of architectural glass, flat panel displays, solar photovoltaic and decorative coating. Our rotatable targets are very friendly to decorative film which ensures scratch resistance and decorative colorful finishes of hard coating on mobile phones, jewelry, watches, eyewear, automotive decoration, domestic appliances,  sanitary wares, hardware, etc.



Packing: 1. Wooden box

                  2. Carton

                  3. As your request


Payment: T/T, L/C, etc.


Delivery time: Normally 20~30 days after payment


Shipping: By air or by sea



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