Specification
Vacuum Chamber | φ1300 × H1300 | Effective Coating Space | φ1150 × H900 |
Voltage/Hz | 380V/50Hz | Actual Power | 70KW |
Max Diameter of Work-Piece×Quality | φ150 × 18PCS | Target | 4 Mid-Frequency Magnetron Cylindrical Targets /10 Arc Targets/2 Planar Target |
Technology | Mid-Frequency + ARC Planar Target + Ion Source (Optional) | Leak Rate | <10-3Pa.L/s |
Ultimate Pressure | 5.0×10-4Pa | Occupation Space | L3600×W3500×H2500MM |
Pump Down Time | (from atm. to 4X10-3 Pa) ≤20 mins | Vacuum Chamber Structure | Vertical Single Open |
Work-Piece Turntable | Lower Frame Structure | Vacuum System | Molecular Pump, Roots Pump, Rotary Vane Pump |
Power Source | DC Inverter Power Source, Pulse-Bias Power Supply, Mid-Frequency Magnetron Power Supply, DC Magnetron Power Supply | Necessary Conditions | Circulating Water Pressure：2-3KG/CM3 Flow：10T/H Compressed Air：4-6KG/CM3 |
Coating Cycle | 0.5~2 Hours/Furnace | Working Gas | Ar, N2, O2, C2H2, etc |
Operational Mode | Manual + Semi-Auto + Full-Automatic/Torch Screen + PLC | Application | Decorative PVD Plating |
Remarks | The Furnace, Outlook and Other Parameters Can be Customized According to Your Requirement | ||