l Continuous Evaporation Coating Machine IKS-OPT2050 vertical type
·For achieve mass, high quality and rapid production, Continuous coating machine is equipped with one set with multi-holes electronic gun and one set continuous feeding to evaporators to evaporating system.
·Continuous coating machine adopt independent work-piece rack inlet and outlet chamber design, vacuum isolation by independent gate valve, transfer system continuous automatic delivery tray system, control system automatic revolution and finished the coating.
·It has independent work-piece rack inlet and outlet chamber and coating chamber, to separate the pre-coating and vacuum coating process, to enhance working cycle, and to make sure the process stability and the environment cleanliness of work-piece rack inlet and outlet.
1. Operation: Auto/Semi-Auto, easy to operate
2. The beat of continuous inlet the work-piece rack: Interval less than 2min
3. Evaporation Source: one set of multi-hole electronic gun evaporation system
4. Evaporation Source: one set of continuous feeding resistive evaporation system
5. Film Coating: Various color optics films and Anti-fingerprint films
6. Accuracy Control: INFICON XTC3/S
7. Vacuum: Molecular pump +Roots pump +Rotary pump
8. Cooling: Three ultra-low temperature condenser connectors
9. Coating Film: Multi-layer optics dielectric film, Anti-fingerprint films
10. Ion Source: Hall source, power 4KW
11. Heating: Adopt sheathed heating pipe to heating
12. Work-piece Rack: Continuous input work-piece revolution rack
13. Process Control: Adopt TFC film system design soft to generate control parameter, then PLC executing control
1. Effective Install Space：W8500XL4500XH3400mm
8. Rate of Deposition: XTC3/S, 0.5nm Precision
2. Vacuum Chamber：W2050XL2050XH1800mm
9. Chamber of work-piece rack inlet and outlet: Could install the module of heating, cleaning and pre-processing, post-processing
3.Loading：Ф1900XH50mm Stainless steel umbrella stand
10. Vacuum: Flow gauge and needle valve control the process gas
4. Target Material: One set of Multi-hole electronic gun, copper cooling water
11. Power Source: 220V 50HZ
5. Evaporation: One set of continuous feeding evaporation system
12. External Flange: KF16 and KF25
6. Vacuum Rang: ATM-6X10-4 Pa
13. Vacuum System: Rotary pump, Roots pump and Molecular pump
7.Ion Source: Hall ion source,4KW
Equipment Structure Introduction:
The equipment consists of the vacuum chamber， vacuum pump group， loading rack operating， coating process， pretreatment and process gas control system.
（1）Chamber of come in and out substrate holders
It is Box-type vacuum chamber, size is W2110XL2110XH450mm.Adopt SUS304 stainless steel plate (thickness is 30mm) to reinforced weld and forming. Stress relieving by annealing. Access door designed on the top. According to the process requirement, the chamber could install the pre-processing, like heating, plasma, and so on. The air connect with processing chamber by a gate valve (W2100XH1500mm).Vacuum system consist by 4 sets FF250/2000 molecular pump , 1 set BSV90,1set ZJP600 and 2 sets 2X-70,to exhaust air.1set low-temp cold trap available for selecting.
（2）Front inlet substrate holder
It is a W2050XL2050XH1800mm square vacuum chamber (Weld water cooling on the outer wall).Rear board designed high valve to connect molecular pump exhaust air. Pump system consist by 8 sets FF250/2000 molecular pump,1 set ZJP300 and 1 set 2X-70.Two side face of the chamber connect with the work-piece inlet and outlet rack chamber by gate valve. Access door install on the front board, SUS304 stainless steel, with two inspection window. The inner wall of chamber installed double layer mirror board and anti-fouling board. The top installed Magnetic fluid imported transfer system, self-rotation system, four sector face sheath heating system and uniform adjust board. The bottom installed 1 set 8 holes copper crucible electronic gun evaporation system, 1 set automatic feeding copper electrode resistive evaporation system, 1 set Hall ion source assistance deposition system,1 set XTC3S coating film thickness degree control system, 2 sets adjustable uniform adjustment plate. The side face of chamber has designed uniform air intake system, two ways flow gauges through mixed gas tank to connect chamber, adjust the coating vacuum degree by flow control.
（3）Sputtering Coating Process System
Adopt film system design soft to design the multi-layer film system, generate control parameter and through the PLC to control the film layer thickness degree deposition by XTC3/S.
· Large area continuous electron gun evaporation photoelectric film，optical film and anti-fingerprints film. IKS-OPT2050 Continuous Evaporation Coating Machine, It is designed to realize mass and rapid production of large-area optical film coating and monolayer surface modified film, it is continuous input vertical multi chamber coating machine, it is a coating system, which base on the double electron gun evaporate material coating to multi-layer optics films. The main product of this equipment are evaporation film multi-layer optical dielectric film, anti-fingerprint film, and so on, such as, visible light color film, aluminum mirror film, AF anti-fingerprint film, low melting point organics film, visible light split light film, visible light anti-reflection film, and so on, it can also be debug production for the specific simple optics film produce.